(1) In IMC, Table 403.3, note h is deleted and replaced with the following: "h. 1. A nail salon shall provide each manicure station where a nail technician files or shapes an acrylic nail, as defined by rule by the Division of Occupational and Professional Licensing, in accordance with Title 63G, Chapter 3, Utah Administrative Rulemaking Act, with: a. a source capture system equipped with, at minimum, a MERV 8 particulate filter and an activated carbon filter that is capable of filtering and recirculating air to inside space at a rate not less than 50 cfm per station; or b. a source capture system capable of exhausting not less than 50 cfm per station. c. A nail salon that complies with Note h.l.a or h.l.b is not required to comply with the labeling, listing, or testing requirements described in International Mechanical Code sections 301.7 or 301.8. 2. For a source capture system described in paragraph 1, the source capture system inlets for exhausting or recirculating air shall be located in accordance with Section 502.20. 3. Where one or more exhausting source capture systems described in paragraph 1 operate continuously during occupancy, the source capture system exhaust rate shall be permitted to be applied to the exhaust flow rate required by Table 403.3.1.1 for the nail salon. 4. The requirements of this note apply to: a. an existing nail salon that remodels the nail salon after July 1, 2017; b. a new nail salon that begins construction after July 1, 2017; and c. all nail salons beginning on July 1, 2020."

(2) In IMC, Section 502.20 is deleted and rewritten as follows: "502.20 Manicure stations. A nail salon that files or shapes an acrylic nail shall provide each manicure station with a source capture system in accordance with Table 403.3.1.1, note h. For a manicure table that does not have factory-installed source capture system inlets for recirculating or exhausting air, a nail salon shall provide the manicure table with inlets for recirculating or exhausting air located not more than 12 inches (305 mm) horizontally and vertically from the point of any acrylic chemical application. Exception: Section 502.20 applies to a manicure station in: a. an existing nail salon that remodels the nail salon after July 1, 2017; b. a new nail salon that begins construction after July 1, 2017; and c. all nail salons beginning on July 1, 2020."